Sputtering onto liquids: a critical review

• Anastasiya Sergievskaya,
• Adrien Chauvin and
• Stephanos Konstantinidis

Beilstein J. Nanotechnol. 2022, 13, 10–53, doi:10.3762/bjnano.13.2

Paper-based triboelectric nanogenerators and their applications: a review

• Jing Han,
• Nuo Xu,
• Yuchen Liang,
• Mei Ding,
• Junyi Zhai,
• Qijun Sun and
• Zhong Lin Wang

Beilstein J. Nanotechnol. 2021, 12, 151–171, doi:10.3762/bjnano.12.12

• stencils by thermal/e-beam evaporation, sputter deposition, or spray deposition. When the stencils are peeled off they can readily leave the metallic patterns on the paper substrate [102] (Figure 5a). In comparison to the conventional printing techniques, vacuum evaporation and vacuum deposition techniques

• usually allow a better control over the material thickness, yielding more homogeneous structures. The vacuum evaporation is applicable to a variety of metals at a high rate of up to 50 nm·s−1; however, it requires expensive equipment and high-vacuum conditions. The sputtering can be conducted by using

• less expensive equipment and under lower vacuum conditions; however, the deposition speed is lower than that of the vacuum evaporation. The thickness of the metal layer obtained by e-beam deposition can be up to several micrometers, which is lower than the thickness of the metal layer obtained by

Absorption and photoconductivity spectra of amorphous multilayer structures

• Oxana Iaseniuc and
• Mihail Iovu

Beilstein J. Nanotechnol. 2020, 11, 1757–1763, doi:10.3762/bjnano.11.158

• measurements; other samples were prepared as granules of small dimensions for vacuum evaporation. For optical and photoelectric measurements, thin film samples of each amorphous material, with thickness values of d = 1000 nm for As0.40S0.30Se0.30, d = 500 nm for Ge0.09As0.09Se0.82, and d = 200 nm for

Gas-sensing features of nanostructured tellurium thin films

• Dumitru Tsiulyanu

Beilstein J. Nanotechnol. 2020, 11, 1010–1018, doi:10.3762/bjnano.11.85

• ] started to thoroughly investigate the use of Te thin films as an active element in gas sensor manufacturing. They showed that microcrystalline Te thin films, grown by thermal vacuum evaporation, exhibit high sensitivity to low concentrations (ppm range) of nitrogen dioxide (NO2) even at room temperature

• via thermal vacuum evaporation of pure Te [18][19][20]. Tests were performed in those films in order to access their ability to detect both oxidizing (NO2) and reducing (H2S) toxic gases at temperatures between 77 and 423 K. Depending on the experimental conditions in which the films were prepared

• grown using either the thermal vacuum evaporation of pure Te [17][18][19][20] or its sputtering under a pure argon atmosphere [24] onto glass, Al2O3 or sapphire substrates. It was shown that the film morphology as well as the gas sensitivity is controlled by several factors, such as the nature and

Effect of Ag loading position on the photocatalytic performance of TiO₂ nanocolumn arrays

• Jinghan Xu,
• Yanqi Liu and
• Yan Zhao

Beilstein J. Nanotechnol. 2020, 11, 717–728, doi:10.3762/bjnano.11.59

• deposition (ALD) and vacuum evaporation. The effects of the Ag loading position and deposition thickness, and the morphology, structure and composition of Ag-deposited TNC arrays on its optical and photocatalytic properties were studied. The Ag-filled TiO2 (AFT) nanocolumn arrays exhibited higher removal

• nanocolumns was deposited (300 cycles) on the AAO template using ALD (home-built) with TiCl4 as the precursor. The preparation of Ag-filled TiO2 nanocolumns (AFT) was as follows: A sample deposited with TiO2 was placed in a vacuum evaporation apparatus (Shen Yang, LN-1004A) and subjected to Ag deposition at a

• vacuum evaporation apparatus for deposition of Ag particles under the same conditions described above. We made samples with different parameters by changing the deposition time of Ag. Samples of all parameters are shown in Table 1. Characterization The surface and cross-sectional morphology of the Ag-TNC

Nontoxic pyrite iron sulfide nanocrystals as second electron acceptor in PTB7:PC₇₁BM-based organic photovoltaic cells

• Olivia Amargós-Reyes,
• José-Luis Maldonado,
• Omar Martínez-Alvarez,
• María-Elena Nicho,
• José Santos-Cruz,
• Juan Nicasio-Collazo,
• Irving Caballero-Quintana and
• Concepción Arenas-Arrocena

Beilstein J. Nanotechnol. 2019, 10, 2238–2250, doi:10.3762/bjnano.10.216

• ) (PTB7) blended with [6,6]-phenyl C71-butyric acid methyl ester (PC71BM) have shown PCEs of >2% and >7%, respectively, with standard electrodes (Al, Ag) deposited through a high-vacuum evaporation process [26][27][28][29]. In our previous work [30][31][32][33], we used the eutectic Field’s metal (FM) as

Revisiting semicontinuous silver films as surface-enhanced Raman spectroscopy substrates

• Malwina Liszewska,
• Bogusław Budner,
• Małgorzata Norek,
• Bartłomiej J. Jankiewicz and
• Piotr Nyga

Beilstein J. Nanotechnol. 2019, 10, 1048–1055, doi:10.3762/bjnano.10.105

• substrates were first cleaned with piranha solution (H2SO4/H2O2 3:1) for 30 minutes, then rinsed with deionized water, followed by multiple rinses with ethanol. The substrates were then placed in an electron beam vacuum evaporation chamber. The base pressure of the chamber was about 2 × 10−6 mbar. Deposition

Cytotoxicity of doxorubicin-conjugated poly[N-(2-hydroxypropyl)methacrylamide]-modified γ-Fe₂O₃ nanoparticles towards human tumor cells

• Zdeněk Plichta,
• Yulia Kozak,
• Rostyslav Panchuk,
• Viktoria Sokolova,
• Matthias Epple,
• Lesya Kobylinska,
• Pavla Jendelová and
• Daniel Horák

Beilstein J. Nanotechnol. 2018, 9, 2533–2545, doi:10.3762/bjnano.9.236

• diluted in ethyl acetate (50 mL). Residual compounds and ethyl acetate were removed by filtration and vacuum-evaporation, respectively, and MMAA was distilled (100 °C/13 Pa); yield 55%. 1H NMR (CDCl3) δ 1.96 (s, 3H), 3.09 (s, 3H), 3.77 (s, 3H), 4.14 (s, 2H), 5.03 (dd, H), 5.24 (dd, H) (Figure 1a

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• 620 equipment situated into a cleanroom class 100 (ISO EN 14644) with RF magnetron sputtering and thermal vacuum evaporation (using TECTRA equipment). Thus, to contact single Ni–Cu alloy nanowires using a typical EBL process (Zeiss Merlin Compact field-emission scanning electron microscope combined

• , the deposition of Ti and Au contacts (100/200 nm) by RF magnetron sputtering and thermal vacuum evaporation, respectively, was performed. Individual contacted Ni–Cu alloy nanowires are thus obtained. The main steps of the EBL process are shown in Figure 8. The morphological and compositional

Engineering of oriented carbon nanotubes in composite materials

• Razieh Beigmoradi,
• Abdolreza Samimi and
• Davod Mohebbi-Kalhori

Beilstein J. Nanotechnol. 2018, 9, 415–435, doi:10.3762/bjnano.9.41

• or the polymeric membrane was directly dipped in a suspended mixture of CNTs. By using vacuum evaporation, the water content of the composite was ultimately evaporated. The latter CNT–polymer composite was then covered with a polysulfone (PSF) layer. The resulting composite was then pressed for 10–20

Characterization of nanostructured ZnO thin films deposited through vacuum evaporation

• Jose Alberto Alvarado,
• Arturo Maldonado,
• Héctor Juarez,
• Mauricio Pacio and
• Rene Perez

Beilstein J. Nanotechnol. 2015, 6, 971–975, doi:10.3762/bjnano.6.100

• , Benemérita Universidad Autónoma de Puebla, Ciudad Universitaria Avenida San Claudio y 14 Sur, 72570, Puebla, México 10.3762/bjnano.6.100 Abstract This work presents a novel technique to deposit ZnO thin films through a metal vacuum evaporation technique using colloidal nanoparticles (average size of 30 nm

• red and in the violet region and there is a correlation with the annealing process. Keywords: nanostructure; thin film; transmittance; vacuum evaporation; X-ray diffraction (XRD); Introduction ZnO is a II–VI semiconductor compound that has been studied due its wide range of applications in

• ], and RF magnetron sputtering [10]. However, the vacuum evaporation technique is used to deposit worm-form nanostructured thin films. This technique is different from those reported in the literature such as thermal evaporation assisted by inert gases [11], or e-beam evaporation [12]. So this technique

Intake of silica nanoparticles by giant lipid vesicles: influence of particle size and thermodynamic membrane state

• Florian G. Strobl,
• Florian Seitz,
• Christoph Westerhausen,
• Armin Reller,
• Adriano A. Torrano,
• Christoph Bräuchle,
• Achim Wixforth and
• Matthias F. Schneider

Beilstein J. Nanotechnol. 2014, 5, 2468–2478, doi:10.3762/bjnano.5.256

• Angelova et al. [55]. In short, lipids in the desired ratio and 0.05 mol % of the fluorescent marker DiOC14 were mixed in chloroform and spread onto indium tin oxide (ITO)-coated glass slides. The solvent is thoroughly removed through vacuum evaporation. For the swelling procedure, a chamber was assembled

Effect of deposition temperature on the structural and optical properties of chemically prepared nanocrystalline lead selenide thin films

• Anayara Begum,
• Amir Hussain and
• Atowar Rahman

Beilstein J. Nanotechnol. 2012, 3, 438–443, doi:10.3762/bjnano.3.50

• size [2][3]. PbSe has wide applications in long and mid-wavelength infrared detectors, optical amplifiers, mid-infrared lasers, as thermoelectric materials, and as Pb2+ ion selective sensors [4][5][6][7]. Among the various techniques used to prepare PbSe thin films, such as vacuum evaporation [8

Towards multiple readout application of plasmonic arrays

• Dana Cialla,
• Karina Weber,
• René Böhme,
• Uwe Hübner,
• Henrik Schneidewind,
• Matthias Zeisberger,
• Roland Mattheis,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2011, 2, 501–508, doi:10.3762/bjnano.2.54

• plasmonic array was optimized for maximum signal enhancement by finite element method (FEM) simulations (COMSOL Multiphysics). Periodically patterned SERS arrays were fabricated by means of electron beam lithography and Argon ion beam etching. Quartz wafer was coated with 20 nm of gold by vacuum evaporation